Optical lithography beyond conventional resolution limits
US6569575B1 · kind B1 · utility
18Cited by
1References
44Claims
0Family size
Assignee
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Key dates
| Filing date | Jun 19, 2000 |
| Grant date | May 27, 2003 |
| Priority date | — |
| Expiry date | Jun 19, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/50
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Optical lithography scheme making use of light coupling structures, and elastomeric light coupling structures in particular. These light coupling structures comprise protruding portions and connecting portions. The protruding elements are designed to be brought into conformal contact with a resist to be exposed such that the light guided into the protruding elements is coupled from there directly into the resist. The lateral shape and size of the protruding elements defines 1:1 the lateral size and shape of small features to be exposed in the resist.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.