Illumination system with a plurality of light sources
US6570168B1 · kind B1 · utility
27Cited by
16References
25Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 27, 2000 |
| Grant date | May 27, 2003 |
| Priority date | — |
| Expiry date | Jan 13, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K1/06
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention concerns an illumination system for wavelengths<193 nm, especially for EUV-lithography witha plurality of light sourcesa mirror device for creating secondary light sources comprising several mirrors, said mirrors are comprising raster elements.The invention is characterized in thatthe plurality of light sources are coupled together in order to illuminate the exit pupil of the illumination system up to a predetermined degree of filling.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.