In situ measurement
US6574525B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 25, 2002 |
| Grant date | Jun 3, 2003 |
| Priority date | — |
| Expiry date | Mar 25, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67253
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A reaction chamber of the type used to create a reaction at a surface of a substrate disposed within the reaction chamber. A transmitter produces a transmitted beam having first characteristics, where the transmitter is disposed outside of the reaction chamber. A view port is disposed in a boundary wall of the reaction chamber, where the view port is formed of a material that is transparent at least in part to the transmitted beam. The transmitter, the view port, and the substrate are aligned such that the transmitted beam is directable to and reflected at least in part from the surface of the substrate, thereby producing a reflected beam having second characteristics. A receiver is disposed outside of the reaction chamber, and the receiver receives the reflected beam from the surface of the substrate through the view port. The receiver also senses the second characteristics of the reflected beam and reports the second characteristics. A controller receives the second characteristics from the receiver and compares the second characteristics to the first characteristics to determine a difference between the first characteristics and the second characteristics. The difference relates…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.