Photomask
US6576375B1 · kind B1 · utility
13Cited by
4References
17Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Sep 28, 2000 |
| Grant date | Jun 10, 2003 |
| Priority date | — |
| Expiry date | Nov 6, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/58
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photomask comprises a transparent substrate, a anti-reflection structure having a chromium oxide film, a chromium film and a chromium oxide film laminated in order on the major surface of the transparent substrate, an LiF film as a anti-reflection film formed on the surface of the first chromium oxide and at the interface between the chromium oxide film and the transparent substrate, and a spin-on-glass film formed on the surface of the chromium oxide film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.