Seiro Miyoshi
15Patents
4h-index
36Co-inventors
60Inventor score
Filing activity: Dec 8, 1997 → Dec 19, 2016
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6025117A | Method of forming a pattern using polysilane | Physics | 348 | Expired |
| US6270948A | Method of forming pattern | Electricity | 31 | Expired |
| US6576375B1 | Photomask | Physics | 13 | Expired |
| US7779777B2 | Substrate processing apparatus and method | Electricity | 6 | Active |
| US8759177B2 | Pattern forming method | Electricity | 3 | Active |
| US8178366B2 | Pattern forming method, manufacturing method of semiconductor device, and template manufacturing method | Emerging Cross-Sectional Technologies | 2 | Active |
| US9202763B2 | Defect pattern evaluation method, defect pattern evaluation apparatus, and recording media | Electricity | 1 | Active |
| US8423926B2 | Acceptance determining method of blank for EUV mask and manufacturing method of EUV mask | Physics | 1 | Active |
| US7985685B2 | Method of manufacturing semiconductor device | Electricity | 0 | Active |
| US8984454B2 | Pattern data generation method, pattern verification method, and optical image calculation method | Physics | 0 | Active |
| US7973907B2 | Method for treating substrate, method for conveying substrate, and apparatus for conveying substrate | Physics | 0 | Active |
| US9547743B2 | Manufacturing method for a semiconductor device, pattern generating method and nontransitory computer readable medium storing a pattern generating program | Physics | 0 | Active |
| US10176290B2 | Manufacturing method for a semiconductor device, pattern generating method and nontransitory computer readable medium storing a pattern generating program | Physics | 0 | Active |
| US9070559B2 | Pattern forming method and method of manufacturing semiconductor device | Electricity | 0 | Active |
| US9576100B2 | Pattern data generation method, pattern verification method, and optical image calculation method | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.