Ferroelectric capacitor plasma charging monitor
US6576922B1 · kind B1 · utility
16Cited by
6References
4Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Dec 21, 2001 |
| Grant date | Jun 10, 2003 |
| Priority date | — |
| Expiry date | Dec 21, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D1/682
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Plasma charging devices and methods are disclosed for detecting plasma charging during semiconductor wafer processing. Charging monitors are disclosed having ferroelectric capacitance elements which can be preprogrammed prior to processing steps of interest, and then subsequently measured afterwards, in order to determine whether plasma related charging is a problem in the intervening processing steps.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.