Inventor · Sunnyvale, CA, US

Shawming Ma

47Patents
13h-index
66Co-inventors
84Inventor score

Filing activity: Jan 9, 1998 → Nov 7, 2023

Most-cited inventions

PatentTitleAreaCited byStatus
US6485988B2 Hydrogen-free contact etch for ferroelectric capacitor formation Electricity 102 Expired
US6548343B1 Method of fabricating a ferroelectric memory cell Electricity 101 Expired
US6018187A Elevated pin diode active pixel sensor including a unique interconnection structure Emerging Cross-Sectional Technologies 51 Expired
US6281535A Three-dimensional ferroelectric capacitor structure for nonvolatile random access memory cell Electricity 44 Expired
US5936261A Elevated image sensor array which includes isolation between the image sensors and a unique interconnection Electricity 40 Expired
US6554954B2 Conductive collar surrounding semiconductor workpiece in plasma chamber Electricity 36 Expired
US6215164A Elevated image sensor array which includes isolation between uniquely shaped image sensors Electricity 22 Expired
US6614051B1 Device for monitoring substrate charging and method of fabricating same Electricity 17 Expired
US6613666B2 Method of reducing plasma charging damage during dielectric etch process for dual damascene interconnect structures Electricity 16 Expired
US6576922B1 Ferroelectric capacitor plasma charging monitor Electricity 16 Expired
US6114739A Elevated pin diode active pixel sensor which includes a patterned doped semiconductor electrode Electricity 16 Expired
US6396118B1 Conductive mesh bias connection for an array of elevated active pixel sensors Electricity 14 Expired
US6812145B2 Method of reducing plasma charging damage during dielectric etch process for dual damascene interconnect structures Electricity 13 Expired
US8133819B2 Plasma etching carbonaceous layers with sulfur-based etchants Electricity 11 Active
US11062912B2 Atomic layer etch process using plasma in conjunction with a rapid thermal activation process Electricity 7 Active
US6673636B2 Method of real-time plasma charging voltage measurement on powered electrode with electrostatic chuck in plasma process chambers Electricity 5 Expired
US6270192A Monolithic ink jet nozzle formed from an oxide and nitride composition Performing Operations; Transporting 5 Expired
US7432210B2 Process to open carbon based hardmask Electricity 5 Active
US8048806B2 Methods to avoid unstable plasma states during a process transition Electricity 4 Active
US7838432B2 Etch process with controlled critical dimension shrink Electricity 3 Active
US7510976B2 Dielectric plasma etch process with in-situ amorphous carbon mask with improved critical dimension and etch selectivity Electricity 2 Expired
US11049692B2 Methods for tuning plasma potential using variable mode plasma chamber Performing Operations; Transporting 2 Active
US10580661B2 Atomic layer etch process using plasma in conjunction with a rapid thermal activation process Electricity 2 Active
US10790119B2 Plasma processing apparatus with post plasma gas injection Electricity 2 Active
US11289323B2 Processing of semiconductors using vaporized solvents Electricity 1 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.