Reflective spectral filtering of high power extreme ultra-violet radiation
US6577442B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Sep 27, 2001 |
| Grant date | Jun 10, 2003 |
| Priority date | — |
| Expiry date | Sep 27, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/702
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In one embodiment of the invention, a grating structure etched on a mirror substrate has a grating period causing diffracting, out of an optical path, a first incident radiation within a first band around a first wavelength. A multi-layer coating deposited on the grating structure reflects the first incident radiation, in the optical path, within the first band and a second incident radiation within a second band around a second wavelength. In another embodiment, a first multi-layer coating deposited on a mirror substrate reflects a first incident radiation within a first band around a first wavelength and a second incident radiation, in an optical path, within a second band around a second wavelength. A grating structure is deposited on the first multi-layer coating. The grating structure is etched to have a grating period causing diffracting, out of the optical path, the second incident radiation within the second band.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.