Michael Goldstein
56Patents
8h-index
36Co-inventors
78Inventor score
Filing activity: Sep 29, 1993 → Jul 28, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5494439A | Si/SiC composite material and method for making Si/SiC composite material | Chemistry; Metallurgy | 366 | Expired |
| US6030514A | Method of reducing sputtering burn-in time, minimizing sputtered particulate, and target assembly therefor | Chemistry; Metallurgy | 29 | Expired |
| US6522465B1 | Transmitting spectral filtering of high power extreme ultra-violet radiation | Physics | 15 | Expired |
| US7199936B2 | Method and apparatus for polarizing electromagnetic radiation | Physics | 13 | Expired |
| US7635503B2 | Composite metal films and carbon nanotube fabrication | Emerging Cross-Sectional Technologies | 13 | Active |
| US6816648B2 | Integrated waveguide gratings by ion implantation | Physics | 10 | Expired |
| US7666555B2 | Pellicle, methods of fabrication and methods of use for extreme ultraviolet lithography | Physics | 9 | Active |
| US6846086B2 | Mirror assembly with thermal contour control | Physics | 8 | Expired |
| US5417803A | Method for making Si/SiC composite material | Chemistry; Metallurgy | 8 | Expired |
| US7501641B2 | Dual hemispherical collectors | Physics | 7 | Active |
| US7070832B2 | Sublimating process for cleaning and protecting lithography masks | Emerging Cross-Sectional Technologies | 6 | Expired |
| US11534396B2 | Methods of treatment with an ocular implant containing a tyrosine kinase inhibitor | Human Necessities | 4 | Active |
| US6611387B1 | Adjustment of the partial coherence of the light energy in an imaging system | Physics | 4 | Expired |
| US7002164B2 | Source multiplexing in lithography | Physics | 4 | Expired |
| US7139135B2 | Apparatus for adjustment of partial coherence of light energy in an imaging system | Physics | 3 | Expired |
| US11291627B1 | Sustained release biodegradable intracanalicular inserts comprising a hydrogel and cyclosporine | Human Necessities | 3 | Active |
| US6671054B2 | Interferometric patterning for lithography | Physics | 3 | Expired |
| US6577442B2 | Reflective spectral filtering of high power extreme ultra-violet radiation | Physics | 3 | Expired |
| US7183565B2 | Source multiplexing in lithography | Physics | 3 | Expired |
| US6490031B1 | Radiometric scatter monitor | Physics | 3 | Expired |
| US11331267B2 | Sustained release biodegradable intracanalicular inserts comprising a hydrogel and cyclosporine | Human Necessities | 3 | Active |
| US7527920B2 | Active hardmask for lithographic patterning | Physics | 2 | Expired |
| US7033739B2 | Active hardmask for lithographic patterning | Physics | 2 | Expired |
| US6903354B2 | Extreme ultraviolet transition oscillator | Electricity | 2 | Expired |
| US6801298B2 | Light condenser | Physics | 2 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.