Method and apparatus for a network-based mask defect printability analysis system
US6578188B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 7, 2000 |
| Grant date | Jun 10, 2003 |
| Priority date | — |
| Expiry date | Apr 7, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/953
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A mask defect printability simulation server provides simulations, one-dimensional analysis, and reports to multiple clients over a wide area network, such as the Internet. This network-based simulation server allows a client to leverage a core of highly-trained engineers. Additionally, the network-based simulation server can be easily supported since only a single source for the tools associated with the simulation server is necessary for multiple clients. A client can access the simulation server using a standard personal computer having a browser, thereby eliminating the need for client to maintain an expensive database for the server. Finally, in the network-based simulation server, multiple users can view the same mask defect image and provide real-time comments to each other as simulation and analysis are performed on the defect image, thereby encouraging problem solving and decision-making dialogue among the users.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.