Numerical Technologies, Inc.
🏢 View company profile →78Patents
0Active
78Granted
38Portfolio score
Filing activity: Sep 17, 1997 → Oct 14, 2003
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6470489B1 | Design rule checking system and method | Physics | 399 | Expired |
| US5858580A | Phase shifting circuit manufacture method and apparatus | Physics | 359 | Expired |
| US6370679B1 | Data hierarchy layout correction and verification method and apparatus | Physics | 346 | Expired |
| US6505327B2 | Generating an instance-based representation of a design hierarchy | Physics | 227 | Expired |
| US6745372B2 | Method and apparatus for facilitating process-compliant layout optimization | Emerging Cross-Sectional Technologies | 220 | Expired |
| US6928635B2 | Selectively applying resolution enhancement techniques to improve performance and manufacturing cost of integrated circuits | Physics | 217 | Expired |
| US6807663B2 | Accelerated layout processing using OPC pre-processing | Physics | 210 | Expired |
| US6687895B2 | Method and apparatus for reducing optical proximity correction output file size | Physics | 204 | Expired |
| US6777138B2 | Mask product made by selection of evaluation point locations based on proximity effects model amplitudes for correcting proximity effects in a fabricat layout | Emerging Cross-Sectional Technologies | 200 | Expired |
| US6453457B1 | Selection of evaluation point locations based on proximity effects model amplitudes for correcting proximity effects in a fabrication layout | Emerging Cross-Sectional Technologies | 166 | Expired |
| US6757645B2 | Visual inspection and verification system | Physics | 128 | Expired |
| US6453452B1 | Method and apparatus for data hierarchy maintenance in a system for mask description | Physics | 110 | Expired |
| US6578188B1 | Method and apparatus for a network-based mask defect printability analysis system | Emerging Cross-Sectional Technologies | 85 | Expired |
| US6228539A | Phase shifting circuit manufacture method and apparatus | Physics | 79 | Expired |
| US6258493A | Phase shifting circuit manufacture method and apparatus | Physics | 71 | Expired |
| US6523162B1 | General purpose shape-based layout processing scheme for IC layout modifications | Physics | 64 | Expired |
| US6665856B1 | Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effects | Physics | 64 | Expired |
| US6658640B2 | Simulation-based feed forward process control | Physics | 62 | Expired |
| US6753115B2 | Facilitating minimum spacing and/or width control optical proximity correction | Physics | 57 | Expired |
| US6436590B1 | Phase shifting circuit manufacture method and apparatus | Physics | 56 | Expired |
| US6420074B2 | Phase shifting circuit manufacture method and apparatus | Physics | 52 | Expired |
| US6625801B1 | Dissection of printed edges from a fabrication layout for correcting proximity effects | Emerging Cross-Sectional Technologies | 51 | Expired |
| US6560766B2 | Method and apparatus for analyzing a layout using an instance-based representation | Physics | 49 | Expired |
| US6684382B2 | Microloading effect correction | Physics | 49 | Expired |
| US6787271B2 | Design and layout of phase shifting photolithographic masks | Physics | 48 | Expired |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.