Lithographic apparatus, device manufacturing method, and device manufactured thereby
US6583855B2 · kind B2 · utility
22Cited by
7References
25Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 3, 2001 |
| Grant date | Jun 24, 2003 |
| Priority date | — |
| Expiry date | Jul 3, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70191
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic projection system has an optical element provided in the illumination system for changing an elliptically symmetric intensity anomaly of the projection beam in a pupil of the projection apparatus, the optical element being rotated about the optical axis of the projection apparatus such that the change in intensity anomaly introduced by it counteracts an elliptically symmetric intensity anomaly present in the projection beam or introduced by another optical element traversed by the projection beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.