GaN type semiconductor device
US6589808B2 · kind B2 · utility
35Cited by
8References
49Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 10, 2001 |
| Grant date | Jul 8, 2003 |
| Priority date | — |
| Expiry date | Oct 10, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10H20/841
Abstract
A GaN type semiconductor layer having a new structure is provided which incorporates a substrate having surface which is opposite to a GaN type semiconductor layer and which is made of Ti.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.