Plasma processing apparatus and method
US6590179B2 · kind B2 · utility
44Cited by
8References
29Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 26, 2001 |
| Grant date | Jul 8, 2003 |
| Priority date | — |
| Expiry date | Mar 16, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32935
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma processing apparatus having a process chamber to process specimens, a status detecting means for detecting the internal processing status of said process chamber and outputting a plurality of signals, and signal converting means for extracting an arbitrary number of signal processing filters from a signal filter database using a signal filter selecting means and creating an arbitrary number of device status signals. The signal converting means creates fewer effective device status signals of a time series from said output signals.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.