Ryoji Nishio
42Patents
11h-index
37Co-inventors
75Inventor score
Filing activity: May 17, 1996 → Oct 31, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6245202A | Plasma treatment device | Electricity | 67 | Expired |
| US6646233B2 | Wafer stage for wafer processing apparatus and wafer processing method | Electricity | 57 | Expired |
| US6590179B2 | Plasma processing apparatus and method | Electricity | 44 | Expired |
| US7138606B2 | Wafer processing method | Electricity | 36 | Expired |
| US6180019A | Plasma processing apparatus and method | Electricity | 31 | Expired |
| US6825617B2 | Semiconductor processing apparatus | Electricity | 28 | Expired |
| US6895179B2 | Wafer stage for wafer processing apparatus | Electricity | 26 | Expired |
| US6833051B2 | Plasma processing apparatus and method | Electricity | 23 | Expired |
| US6759253B2 | Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring units | Electricity | 15 | Expired |
| US6172321A | Method and apparatus for plasma processing apparatus | Electricity | 14 | Expired |
| US6034346A | Method and apparatus for plasma processing apparatus | Electricity | 13 | Expired |
| US8329054B2 | Plasma processing apparatus and plasma processing method | Electricity | 11 | Active |
| US6716301B2 | Semiconductor manufacturing apparatus and method of processing semiconductor wafer using plasma, and wafer voltage probe | Electricity | 11 | Expired |
| US8906196B2 | Plasma processing apparatus and method for controlling the same | Electricity | 10 | Active |
| US6499424B2 | Plasma processing apparatus and method | Electricity | 10 | Expired |
| US6481370B2 | Plasma processsing apparatus | Electricity | 6 | Expired |
| US6771481B2 | Plasma processing apparatus for processing semiconductor wafer using plasma | Emerging Cross-Sectional Technologies | 6 | Expired |
| US8083889B2 | Apparatus and method for plasma etching | Electricity | 4 | Active |
| US6747239B2 | Plasma processing apparatus and method | Electricity | 4 | Expired |
| US8057634B2 | Method and apparatus for plasma processing | Electricity | 4 | Active |
| US6967109B2 | Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring units | Electricity | 4 | Expired |
| US8632637B2 | Method and apparatus for plasma processing | Electricity | 3 | Active |
| US6846363B2 | Plasma processing apparatus and method | Electricity | 3 | Expired |
| US7833429B2 | Plasma processing method | Electricity | 3 | Active |
| US8940128B2 | Plasma processing apparatus | Electricity | 3 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.