Exposure apparatus and device manufacturing method using the same
US6590631B2 · kind B2 · utility
3Cited by
8References
29Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 23, 1999 |
| Grant date | Jul 8, 2003 |
| Priority date | — |
| Expiry date | Mar 23, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70933
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus includes an illumination system for illuminating a mask with an exposure beam having a wavelength of 250 nm or less, wherein a pattern of the mask can be lithographically transferred to a substrate through the illumination by the illumination system, a conditioning system for circulating an inside gas of the exposure apparatus and a control system for performing at least one of ozone removal and ozone detection, for ozone in the gas circulated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.