Method for determining robot alignment
US6591161B2 · kind B2 · utility
32Cited by
20References
25Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 31, 2001 |
| Grant date | Jul 8, 2003 |
| Priority date | — |
| Expiry date | Jun 17, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/137
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A robot wafer alignment tool uses a reflector mounted on a multi-axis robot to determine the position of the robot or other objects within a chamber. The reflector reflects images to at least one camera from an area or object of interest in the chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.