WaferMaster, Inc.
53Patents
7Active
53Granted
39Portfolio score
Filing activity: Nov 30, 1999 → May 4, 2007 · 7 expiring within 5 years
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6379073B1 | Adjustable joint for a positionable arm | Emerging Cross-Sectional Technologies | 54 | Expired |
| US6271459A | Heat management in wafer processing equipment using thermoelectric device | Electricity | 54 | Expired |
| US6591161B2 | Method for determining robot alignment | Emerging Cross-Sectional Technologies | 32 | Expired |
| US6516244B1 | Wafer alignment system and method | Emerging Cross-Sectional Technologies | 30 | Expired |
| US6394523B1 | Portable enclosure for semiconductor processing | Electricity | 23 | Expired |
| US6410455B1 | Wafer processing system | Emerging Cross-Sectional Technologies | 22 | Expired |
| US6568899B1 | Wafer processing system including a robot | Emerging Cross-Sectional Technologies | 20 | Expired |
| US6911376B2 | Selective heating using flash anneal | Emerging Cross-Sectional Technologies | 20 | Expired |
| US6345150B1 | Single wafer annealing oven | Chemistry; Metallurgy | 18 | Expired |
| US7276457B2 | Selective heating using flash anneal | Emerging Cross-Sectional Technologies | 16 | Expired |
| US6932561B2 | Power generation system | Emerging Cross-Sectional Technologies | 16 | Expired |
| US6212088A | Modular voltage adapter and method for using same | Electricity | 16 | Expired |
| US6887803B2 | Gas-assisted rapid thermal processing | Mechanical Engineering; Lighting; Heating | 14 | Expired |
| US6337467B1 | Lamp based scanning rapid thermal processing | Electricity | 14 | Expired |
| US6303906A | Resistively heated single wafer furnace | Electricity | 14 | Expired |
| US7198677B2 | Low temperature wafer backside cleaning | Electricity | 14 | Expired |
| US6602797B2 | Wafer processing method | Emerging Cross-Sectional Technologies | 13 | Expired |
| US6246031A | Mini batch furnace | Chemistry; Metallurgy | 12 | Expired |
| US6809035B2 | Hot plate annealing | Emerging Cross-Sectional Technologies | 12 | Expired |
| US6737361B2 | Method for H2 Recycling in semiconductor processing system | Chemistry; Metallurgy | 8 | Expired |
| US7362426B1 | Raman and photoluminescence spectroscopy | Physics | 7 | Active |
| US6349546B1 | Liquid gas exchanger | Mechanical Engineering; Lighting; Heating | 7 | Expired |
| US7599048B2 | Optical emission spectroscopy process monitoring and material characterization | Physics | 7 | Active |
| US6636626B1 | Wafer mapping apparatus and method | Physics | 6 | Expired |
| US7358200B2 | Gas-assisted rapid thermal processing | Mechanical Engineering; Lighting; Heating | 6 | Expired |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.