Method and device for epitaxial deposition of atoms or molecules from a reactive gas on a deposition surface of a substrate

US6592664B1 · kind B1 · utility

Assignee

• Robert Bosch GmbH · DE

Inventors

• Wilhelm Frey · Palo Alto, US
• Franz Laermer · Stuttgart, DE
• Klaus Heyers · Reutlingen, DE

Key dates

• Filing date: Sep 6, 2000
• Grant date: Jul 15, 2003
• Expiry date: Sep 6, 2020

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T117/10
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A method for epitaxial deposition of atoms or molecules from a reactive gas on a deposition surface of a substrate is described. The method includes the following steps:a first amount of energy is supplied by heating at least the deposition surface; andan ionized inert gas is conducted, at least from time to time, onto the deposition surface in order to supply, at least from time to time, a second amount of energy through the effect of ions of the ionized inert gas on the deposition surface.The first amount of energy is less than the energy amount necessary for the epitaxial deposition of atoms or molecules of the reactive gas on the deposition surface. A sum of the first energy amount and the second energy equaling, at least from time to time, a total amount of energy that is sufficient for the epitaxial deposition of atoms or molecules of the reactive gas onto the deposition surface.