System for and method of using developer as a solvent to spread photoresist faster and reduce photoresist consumption
US6592939B1 · kind B1 · utility
1Cited by
3References
14Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 6, 2001 |
| Grant date | Jul 15, 2003 |
| Priority date | — |
| Expiry date | Oct 17, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/162
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An exemplary method of using developer as a solvent to spread photoresist faster and reduce photoresist consumption can include dispensing a developer solution onto an integrated circuit wafer, spinning the integrated circuit wafer to distribute the developer solution over the integrated circuit wafer, and dispensing a photoresist solution onto the integrated circuit covered with the developer solution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.