Structure for a reflection lithography mask and method for making same
US6593036B1 · kind B1 · utility
5Cited by
4References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 13, 2001 |
| Grant date | Jul 15, 2003 |
| Priority date | — |
| Expiry date | Mar 13, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K2201/067
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
The invention concerns a structure for a lithographic reflection mask comprising a receive medium (12) on which is fixed a reflector (11) including at least one layer, the reflector (11) being fixed to the receive medium (12) in a reverse manner relative to a manufacturing medium (10) on which it has previously been manufactured and which is then
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.