Patent · US Expired

System of a package fabricated on a semiconductor or dielectric wafer with wiring on one face, vias extending through the wafer, and external connections on the opposing face

US6593644B2 · kind B2 · utility

58Cited by
6References
15Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 19, 2001
Grant dateJul 15, 2003
Priority date
Expiry dateMay 20, 2021

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/10253
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A semiconductor or dielectric wafer with conducting vias is used as a substrate in an integrated circuit packaging structure, where high density inter and intra chip contacts and wiring are positioned on the substrate face on which the integrated circuitry is mounted, and external signal and power circuitry is contacted through the opposite face. Use of a substrate such as silicon permits the use of conventional silicon processes available in the art for providing high wiring density together with matching of the thermal expansion coefficient of any silicon chips in the integrated circuits. The use of vias through the substrate allows a high density of connections leaving the silicon substrate and provides short paths for the connections of power and signals.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.