Use of cinnamic acid groups containing acetal polymers for radiation-sensitive compositions and lithographic printing plates

US6596456B2 · kind B2 · utility

Assignee

• Kodak Polychrome Graphics Company Ltd. · US

Inventors

• Harald Baumann · Tuttlingen, DE
• Michael Flugel · Osterode, DE
• Eduard Kottmair · Ebenhausen, DE

Key dates

• Filing date: Apr 11, 2002
• Grant date: Jul 22, 2003
• Expiry date: Apr 11, 2022

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/0388
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Copolymers containing the units A, B, C, D and optionally E are used to prepare radiation sensitive compositions and lithographic printing plates. The copolymer contains about 25 to 55 mol % of unit A which has the formula The copolymer contains about 0.5 to 25 mol % of unit B which has the formula wherein R1 is selected from the group consisting of alkyl, aryl and aralkyl.The copolymer contains about 0.5 to 40 mol % of unit C which has the formula wherein X is an aliphatic or aromatic spacer group, and Ac is an acidic group selected from the group consisting of —COOH, —SO3H, —SO2NR9R10 with R9 and R10 independently being selected from hydrogen and alkyl; and when X is phenylene, Ac can also be OH.The copolymer contains about 20 to 70 mol % of unit D which has the formula wherein Ci is selected from the group consisting of Ci-1, Ci-2, Ci-3 and Ci-4 which are represented by the following formulae wherein:k, m and n are integers independently selected from 0 to 5,R3, R4 and R7 are independently selected from the group consisting of alkyl, alkoxy, —COOR8, —NR9R10, —NH—CO—CH3, halogen, and cyano,R8 is selected from hydrogen and alkyl,R9 a…