Michael Flugel
10Patents
3h-index
11Co-inventors
53Inventor score
Filing activity: Feb 12, 2002 → Sep 12, 2014
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7169534B2 | Photopolymer composition suitable for lithographic printing plates | Chemistry; Metallurgy | 10 | Expired |
| US7442486B2 | Radiation-sensitive compositions comprising oxazole derivatives and imageable elements based thereon | Physics | 8 | Expired |
| US6664025B2 | Visible radiation sensitive composition | Emerging Cross-Sectional Technologies | 4 | Expired |
| US6596456B2 | Use of cinnamic acid groups containing acetal polymers for radiation-sensitive compositions and lithographic printing plates | Physics | 3 | Expired |
| US9063423B2 | Lithographic printing plate precursors and use | Performing Operations; Transporting | 2 | Active |
| US7285372B2 | Radiation-sensitive elements and their storage stability | Emerging Cross-Sectional Technologies | 1 | Expired |
| US9329485B2 | Method for making lithographic printing plates | Physics | 1 | Active |
| US8354216B2 | Negative-working imaging elements and methods of use | Performing Operations; Transporting | 0 | Active |
| US9201302B2 | Negative-working lithographic printing plate precursor | Performing Operations; Transporting | 0 | Active |
| US7574959B2 | Radiation-sensitive compositions and imageable elements based thereon | Emerging Cross-Sectional Technologies | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.