Lithographic apparatus, device manufacturing method, and device manufactured thereby
US6597429B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 12, 2001 |
| Grant date | Jul 22, 2003 |
| Priority date | — |
| Expiry date | Apr 12, 2021 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF16C2300/62
- WIPO fieldMechanical elements
- WIPO sectorMechanical engineering
Abstract
A lithographic projection apparatus comprises a vacuum chamber having a wall enclosing at least one of first and second object tables, the or each object table within the vacuum chamber being connected to positioning means for positioning the object table with respect to a projection system of the apparatus. The positioning means is provided with a pneumatic gravity compensator comprising a piston associated with the object table; a gas-filled pressure chamber, the gas in the pressure chamber acting on the movable member to at least partially counteract the weight of the object table; a gas bearing; and evacuating means for evacuating gas escaping through a gap between the movable member and a bearing surface of a cylindrical housing towards the vacuum chamber. A partially flexible rod connects the piston to the object table.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.