Gas delivery system
US6602433B1 · kind B1 · utility
10Cited by
2References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 18, 2000 |
| Grant date | Aug 5, 2003 |
| Priority date | — |
| Expiry date | Dec 18, 2020 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01J2219/0894
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A substrate is treated by supplying an etchant and/or deposition gas into a chamber in which the substrate is situated. In order to avoid the problems associated with transportation of toxic gases, the gases required for such processes are delivered directly from a gas generation and delivery system positioned locally to the chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.