Antireflective coating compositions and exposure methods under 200 nm

US6602652B2 · kind B2 · utility

Assignee

• Shipley Company, L.L.C. · US

Inventors

• Timothy G. Adams · Sudbury, US
• Edward K. Pavelchek · Stow, US
• Roger F. Sinta · Woburn, US
• Manuel DoCanto · Stoughton, US
• Robert F. Blacksmith · Hubbardston, US
• Peter Trefonas, III · Medway, US

Key dates

• Filing date: Apr 20, 2002
• Grant date: Aug 5, 2003
• Expiry date: Apr 20, 2022

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/091
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition (ARC), particularly suitable for short wavelength imaging applications such as 193 nm. The ARCs of the invention are preferably used with an overcoated resist layer (i.e. bottom layer ARCs) and in general comprise novel ARC resin binders that can effectively absorb reflected sub-200 nm exposure radiation.