Manufacture of integrated fluidic devices
US6602791B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 27, 2001 |
| Grant date | Aug 5, 2003 |
| Priority date | — |
| Expiry date | Jul 18, 2021 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01L2400/0415
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
In a method of fabricating a microstructure for microfluidics applications, a first layer of etchable material is formed on a suitable substrate. A mechanically stable support layer is formed over the etchable material. A mask is applied over the support to expose at least one opening in the mask. An anistropic etch is then performed through the opening to create a bore extending through the support layer to said layer of etchable material. After performing an isotropic etch through the bore to form a microchannel in the etchable material extending under the support layer, a further layer is deposited over the support layer until overhanging portions meet and thereby close the microchannel formed under the opening.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.