Abrasive article having a window system for polishing wafers, and methods
US6604985B2 · kind B2 · utility
16Cited by
15References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 7, 2002 |
| Grant date | Aug 12, 2003 |
| Priority date | — |
| Expiry date | Nov 7, 2022 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB24B37/205
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A process for planarizing, polishing, or providing other modification of a wafer surface or other workpiece. The process includes using an abrasive article having a textured abrasive coating affixed to a backing. The abrasive article includes a monitoring element, such as a window, to allow transmission of radiation therethrough. The radiation level is monitored throughout the planarization process to determine the approach of the desired endpoint. The window in the abrasive coating can be an area devoid of abrasive coating or having minimal or a thinned abrasive coating.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.