Photoresist monomers, polymers thereof, and photoresist compositions containing the same
US6607868B2 · kind B2 · utility
448Cited by
3References
24Claims
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Key dates
| Filing date | Jun 25, 2001 |
| Grant date | Aug 19, 2003 |
| Priority date | — |
| Expiry date | Nov 28, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/106
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
Dipropargyl acetamide derivatives of following Formula 1 which are photoresist monomers, polymers thereof, and photoresist compositions containing the same. The photoresist polymer has high etching resistance, adhesiveness and post-exposure delay stability. As a result, the photoresist composition is suitable to form a fine pattern in a deep ultraviolet region. wherein, n is an integer from 0 to 5.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.