Low leakage PMOS on-chip decoupling capacitor cells compatible with standard CMOS cells
US6608365B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 4, 2002 |
| Grant date | Aug 19, 2003 |
| Priority date | — |
| Expiry date | Jun 4, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D1/66
Abstract
An on-chip decoupling capacitor cell is disclosed that is compatible with standard CMOS cells. A cell boundary defining the area of the cell includes a first transistor area and a second transistor area. A PMOS transistor having an n-well is formed within the first transistor area. The on-chip decoupling capacitor cell further includes an n-well extension that extends the n-well into the second transistor area, thereby providing a decoupling capacitor cell having reduced leakage compared to a CMOS capacitor cell, and increased capacitance per unit area compare with a traditional PMOS capacitor cell.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.