Filtered mask enclosure
US6610123B2 · kind B2 · utility
20Cited by
17References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 17, 2001 |
| Grant date | Aug 26, 2003 |
| Priority date | — |
| Expiry date | Dec 17, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/906
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The present invention includes a filtered mask enclosure having an exterior portion and interior regions within the exterior portion such that the interior regions have a filtering region and a purging region connected to the filtering region. The present invention further includes a method of removing a first contaminant in a gas phase, a second contaminant in a solid phase, and a third contaminant having an electrical charge from a purge gas and flowing the purge gas through a vicinity of a mask while exposing a wafer with light through the mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.