Giang T. Dao
38Patents
18h-index
26Co-inventors
81Inventor score
Filing activity: Apr 15, 1992 → Jan 23, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5302477A | Inverted phase-shifted reticle | Physics | 137 | Expired |
| US5620816A | Layout methodology, mask set, and patterning method for phase-shifting lithography | Physics | 79 | Expired |
| US5635316A | Layout methodology, mask set, and patterning method for phase-shifting lithography | Physics | 75 | Expired |
| US5595843A | Layout methodology, mask set, and patterning method for phase-shifting lithography | Physics | 73 | Expired |
| US5384219A | Reticle with structurally identical inverted phase-shifted features | Physics | 44 | Expired |
| US5881125A | Attenuated phase-shifted reticle using sub-resolution pattern | Physics | 35 | Expired |
| US5446521A | Phase-shifted opaquing ring | Physics | 35 | Expired |
| US5354632A | Lithography using a phase-shifting reticle with reduced transmittance | Physics | 31 | Expired |
| US6548417B2 | In-situ balancing for phase-shifting mask | Emerging Cross-Sectional Technologies | 30 | Expired |
| US5300379A | Method of fabrication of inverted phase-shifted reticle | Physics | 27 | Expired |
| US8916872B1 | Method of forming a stacked low temperature diode and related devices | Electricity | 26 | Active |
| US6279249A | Reduced particle contamination manufacturing and packaging for reticles | Electricity | 25 | Expired |
| US6660649B2 | In-situ balancing for phase-shifting mask | Emerging Cross-Sectional Technologies | 23 | Expired |
| US5789118A | Method and apparatus for precision determination of phase-shift in a phase-shifted reticle | Physics | 23 | Expired |
| US6610123B2 | Filtered mask enclosure | Emerging Cross-Sectional Technologies | 20 | Expired |
| US5700602A | Method and apparatus for precision determination of phase-shift in a phase-shifted reticle | Physics | 20 | Expired |
| US6715495B2 | Reduced particle contamination manufacturing and packaging for reticles | Electricity | 19 | Expired |
| US5348826A | Reticle with structurally identical inverted phase-shifted features | Physics | 18 | Expired |
| US8786130B1 | Method of forming an electromechanical power switch for controlling power to integrated circuit devices and related devices | Performing Operations; Transporting | 14 | Active |
| US5618643A | Embedded phase shifting mask with improved relative attenuated film transmission | Physics | 14 | Expired |
| US6763608B2 | Method of transporting a reticle | Electricity | 12 | Expired |
| US5633102A | Lithography using a new phase-shifting reticle | Physics | 11 | Expired |
| US6734443B2 | Apparatus and method for removing photomask contamination and controlling electrostatic discharge | Physics | 11 | Expired |
| US5688409A | Processes for fabricating device layers with ultrafine features | Physics | 10 | Expired |
| US9087689B1 | Method of forming a stacked low temperature transistor and related devices | Electricity | 8 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.