Resist film removal apparatus and resist film removal method
US6610168B1 · kind B1 · utility
16Cited by
12References
3Claims
0Family size
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Key dates
| Filing date | Aug 14, 2000 |
| Grant date | Aug 26, 2003 |
| Priority date | — |
| Expiry date | Oct 20, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T156/1121
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A line slit nozzle for spraying steam is disposed along a diameter of a resist film. Steam containing a mist is sprayed onto a surface of the resist film. The film is thereby peeled off and removed. By using a change in physical properties (swelling, etc.) of the resist film by water, the film is easily and surely peeled off. Breakaway from much resources/energy consumption type techniques is realized. In other words, realized are environment-symbiosis type techniques by which resist films can be removed independently of the quantity of energy and kinds of chemical solvents.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.