Information storage on masks for microlithographic tools
US6610446B2 · kind B2 · utility
4Cited by
2References
15Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jan 26, 2001 |
| Grant date | Aug 26, 2003 |
| Priority date | — |
| Expiry date | Jan 26, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/20
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A mask includes an in-situ information storage mechanism on the mask, which stores mask pattern data that is supplied to a microlithographic tool (e.g., an optical stepper). The advantages of using the invention include immediate availability of pattern data of a particular mask to the microlithographic tool for improved integrated circuit productivity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.