Michael Lercel
16Patents
6h-index
43Co-inventors
66Inventor score
Filing activity: May 12, 1998 → Jun 30, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6498096B2 | Borderless contact to diffusion with respect to gate conductor and methods for fabricating | Electricity | 57 | Expired |
| US6261726A | Projection electron-beam lithography masks using advanced materials and membrane size | Electricity | 15 | Expired |
| US6215190A | Borderless contact to diffusion with respect to gate conductor and methods for fabricating | Electricity | 11 | Expired |
| US6555297B1 | Etch stop barrier for stencil mask fabrication | Physics | 9 | Expired |
| US7588879B2 | Graded spin-on organic antireflective coating for photolithography | Emerging Cross-Sectional Technologies | 7 | Active |
| US6806006B2 | Integrated cooling substrate for extreme ultraviolet reticle | Emerging Cross-Sectional Technologies | 7 | Expired |
| US6461797B1 | Method and apparatus for selectively programming a semiconductor device | Electricity | 5 | Expired |
| US6610446B2 | Information storage on masks for microlithographic tools | Physics | 4 | Expired |
| US7816069B2 | Graded spin-on organic antireflective coating for photolithography | Emerging Cross-Sectional Technologies | 4 | Active |
| US6528215B1 | Substrate for diamond stencil mask and method for forming | Physics | 1 | Expired |
| US7110195B2 | Monolithic hard pellicle | Physics | 1 | Expired |
| US11086229B2 | Method to predict yield of a device manufacturing process | Physics | 1 | Active |
| US6635389B1 | Method of defining and forming membrane regions in a substrate for stencil or membrane marks | Physics | 1 | Expired |
| US11714357B2 | Method to predict yield of a device manufacturing process | Physics | 0 | Active |
| US7067220B2 | Pattern compensation techniques for charged particle lithographic masks | Emerging Cross-Sectional Technologies | 0 | Expired |
| US7351348B2 | Evaporation control using coating | Emerging Cross-Sectional Technologies | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.