Supercritical fluid delivery and recovery system for semiconductor wafer processing
US6612317B2 · kind B2 · utility
42Cited by
17References
20Claims
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Key dates
| Filing date | Apr 18, 2001 |
| Grant date | Sep 2, 2003 |
| Priority date | — |
| Expiry date | Oct 16, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P20/54
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A continuous flow, steady state fluid delivery and recovery system for a process chamber and processes requiring supercritical fluid and desired additives including co-solvents, for conducting repetitive batch processing operations in an automated environment, for such processes as supercritical carbon dioxide cleaning and processing of semiconductor wafers. The system provides for steady-state operation of fluid flow and byproducts recovery while the process chamber is brought rapidly and repeatedly on and off line as in batch operations and for various process steps.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.