David Mount
6Patents
4h-index
15Co-inventors
46Inventor score
Filing activity: Dec 14, 1999 → Apr 5, 2004
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6612317B2 | Supercritical fluid delivery and recovery system for semiconductor wafer processing | Emerging Cross-Sectional Technologies | 42 | Expired |
| US6331227A | Enhanced etching/smoothing of dielectric surfaces | Electricity | 35 | Expired |
| US6624081B2 | Enhanced etching/smoothing of dielectric surfaces | Electricity | 15 | Expired |
| US6602349B2 | Supercritical fluid cleaning process for precision surfaces | Emerging Cross-Sectional Technologies | 14 | Expired |
| US7108001B2 | Method and apparatus for rotation of a workpiece in supercritical fluid solutions for removing photo resist, residues and particles therefrom | Emerging Cross-Sectional Technologies | 2 | Expired |
| US6935352B2 | Adding energy to a cleaning process fluid for removing photo resist, residues and particles from semiconductor substrates, photo masks, reticles, disks and flat-panel displays | Electricity | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.