Spraying method of a dispense system
US6612505B2 · kind B2 · utility
12Cited by
5References
9Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 15, 2001 |
| Grant date | Sep 2, 2003 |
| Priority date | — |
| Expiry date | Nov 15, 2021 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05B9/03
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A spraying method of a dispense system for preventing residue, wherein a precise amount of stream fluid is supplied from a fluid supply through a main tube to a nozzle, and the precise amount of stream fluid is sprayed onto a surface of a wafer. A sub-tube system, which comprises a bypass valve and a pin hole is utilized to refill the fluid to a void. A metering valve is used as a suck-back system to retrieve the remaining fluid in the main tube and prevent residue from occurring.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.