Patent · US Expired

Method for improving substrate alignment

US6613589B2 · kind B2 · utility

3Cited by
3References
9Claims
0Family size

Assignee

Inventor

Key dates

Filing dateApr 6, 2001
Grant dateSep 2, 2003
Priority date
Expiry dateMay 9, 2021

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F9/7046
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A method for improving substrate alignment on a stepper comprises imposing predetermined corrections on each of a plurality of substrates, a different set of corrections for each substrate. The actual corrections occurring on the substrates are measured and mathematically processed to produce a matrix and a plurality of equations. The equations are resolved to provide correct corrections for accurate alignment.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.