Multi-beam shaped beam lithography system
US6614035B2 · kind B2 · utility
8Cited by
7References
8Claims
0Family size
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Key dates
| Filing date | Jan 30, 2002 |
| Grant date | Sep 2, 2003 |
| Priority date | — |
| Expiry date | Jan 30, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31776
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A multi-beam shaped-beam electron beam lithography system employs conventional lenses and magnetic deflectors, with an array of lithographically fabricated electrodes disposed about a central axis to simultaneously and independently deflect electron beams in beamlet exposure ranges separated transversely from one another within a subfield, so that subfields overlap.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.