Patent · US Expired

Optical structure and method for producing the same

US6614575B1 · kind B1 · utility

3Cited by

10References

6Claims

0Family size

Assignee

Infineon Technologies AG · DE

Inventors

Ulrike Gruning · Hopewell Junction, US
Volker Lehmann · Hersbruck, DE
Reinhard Stengl · Stadtbergen, DE
Hermann Wendt · Grasbrunn, DE
Hans Reisinger · Grünwald, DE

Key dates

Filing date	Aug 10, 2000
Grant date	Sep 2, 2003
Priority date	—
Expiry date	Apr 11, 2021

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB82Y20/00
WIPO fieldMicro-structural and nano-technology
WIPO sectorChemistry

Abstract

An optical structure includes a substrate having semiconductor material and a grating structure. The grating structure has the property of emitting at least one frequency band so that light having a frequency from that frequency band cannot propagate in the grating structure. The grating structure has a configuration of pores and a defective region. The pores are disposed outside the defective region in a periodic array, and the periodic array is disturbed in the defective region. A surface of the grating structure is provided with a conductive layer at least in the vicinity of the defective region. A method for producing the optical structure is also provided.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.