Patent · US Expired

Method for identifying the best tool in a semiconductor manufacturing process

US6615101B1 · kind B1 · utility

5Cited by
2References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 17, 2000
Grant dateSep 2, 2003
Priority date
Expiry dateAug 24, 2021

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L22/20
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A computer-implemented method for identifying a best tool from a plurality of tools that perform a same operation in a semiconductor fabrication line that includes the steps of determining a first median yield for each of the plurality of tools within a first time interval, weighting the first median yield based on a total number of wafers processed by each of the plurality of tools within the first time interval, determining a second median yield for the semiconductor fabrication line over the first time interval, obtaining a weighted yield difference for each of the plurality of tools relative to the second median yield, and outputting the weighted yield difference for each of the plurality of tools.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.