Patent · US Expired

Forming a pattern of a negative photoresist

US6617086B2 · kind B2 · utility

1Cited by

5References

21Claims

0Family size

Assignee

International Business Machines Corporation · US

Inventors

Marie Angelopoulos · Briarcliff Manor, US
Edward D. Babich · Chappaqua, US
Inna V. Babich · Chappaqua, US
Katherina Babich · Chappaqua, US
James J. Bucchignano · Yorktown, US
Karen E. Petrillo · Mahopac, US
Steven A. Rishton · Hayward, US

Key dates

Filing date	Mar 2, 2001
Grant date	Sep 9, 2003
Priority date	—
Expiry date	Sep 19, 2021

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S430/111
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A new group of non-chemically amplified negative tone water/aqueous base developable (photo) resists based on redistribution of carbon-oxygen bonds in pendant ester groups of the polymers has been found.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.