System and method for reticle protection and transport

US6619903B2 · kind B2 · utility

Inventors

• Glenn Friedman · Encinitas, US
• Michael DeMarco · Victor, US
• Jorge Ivaldi · Trumbull, US
• James McClay · Orland Park, US

Key dates

• Filing date: Aug 10, 2001
• Grant date: Sep 16, 2003
• Expiry date: Aug 10, 2021

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S414/14
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

A reticle protection and transport system and method for a lithography tool. The system includes an indexer that stores a plurality of reticles and a removable reticle cassette. The removable reticle cassette is comprised of an inner chamber and an outer chamber. The system further includes an end effector coupled to a robotic arm. The end effector engages one of the plurality of reticles to enable the reticle to be positioned within the removable reticle cassette and thereafter transported. The system further includes a seal, coupled to the end effector and the robotic arm. To transport the reticle, the reticle is first loaded onto the end effector. Next, the end effector is used to create an arrangement wherein the reticle is loaded into the removable reticle cassette. Importantly, the reticle and removable reticle cassette do not come into contact with one another. The reticle and removable reticle cassette arrangement is then sealed and transported from the indexer to a mount for performing lithographic exposure. Once lithographic exposure is completed, the arrangement is returned to the indexer and the reticle is withdrawn from the removable reticle cassette.