Jorge Ivaldi
14Patents
8h-index
20Co-inventors
64Inventor score
Filing activity: Feb 10, 2000 → Feb 6, 2007
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6411426B1 | Apparatus, system, and method for active compensation of aberrations in an optical system | Physics | 31 | Expired |
| US6507390B1 | Method and apparatus for a reticle with purged pellicle-to-reticle gap | Physics | 20 | Expired |
| US6398373B1 | Pneumatic control system and method for shaping deformable mirrors in lithographic projection systems | Emerging Cross-Sectional Technologies | 19 | Expired |
| US6619903B2 | System and method for reticle protection and transport | Emerging Cross-Sectional Technologies | 15 | Expired |
| US6559922B2 | Method and apparatus for a non-contact scavenging seal | Physics | 12 | Expired |
| US6556281B1 | Flexible piezoelectric chuck and method of using the same | Physics | 12 | Expired |
| US6822731B1 | Method and apparatus for a pellicle frame with heightened bonding surfaces | Physics | 11 | Expired |
| US6991416B2 | System and method for reticle protection and transport | Emerging Cross-Sectional Technologies | 10 | Expired |
| US7249925B2 | System and method for reticle protection and transport | Emerging Cross-Sectional Technologies | 8 | Expired |
| US6847434B2 | Method and apparatus for a pellicle frame with porous filtering inserts | Physics | 5 | Expired |
| US6757110B2 | Catadioptric lithography system and method with reticle stage orthogonal to wafer stage | Physics | 2 | Expired |
| US7173689B2 | Method and system for a pellicle frame with heightened bonding surfaces | Physics | 2 | Expired |
| US6977716B2 | Catadioptric lithography system and method with reticle stage orthogonal to wafer stage | Physics | 1 | Expired |
| US7339653B2 | System for a pellicle frame with heightened bonding surfaces | Physics | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.