Patent · US Expired

Apparatus for fabricating encapsulated micro-channels in a substrate

US6621174B2 · kind B2 · utility

0Cited by
8References
8Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 15, 2002
Grant dateSep 16, 2003
Priority date
Expiry dateJul 15, 2022

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10H20/80
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

An apparatus for fabricating encapsulated micro-channels in a substrate is described. The apparatus includes the formation of a thin film layer over an area of a substrate. Following the formation of the thin layer, a periodic array of access windows are formed within the thin film layer along dimensions of one or more desired micro-channels. Following formation of the access windows, the one or more micro-channels are formed within an underlying layer of the substrate. Finally, the one or more micro-channels are encapsulated, thereby closing the one or more access windows along the dimensions of the desired micro-channels. Accordingly, the apparatus is suitable in one context for rapid prototyping of micro-electromechanical systems in the areas of, for example, RF micro-systems, fluidic micro-systems and bio-fluidic applications. In addition, the apparatus enables the rapid prototyping of integrated circuits.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.