Patent · US Expired

Base-pad for a polishing pad

US6623337B2 · kind B2 · utility

11Cited by

29References

10Claims

0Family size

Assignee

Rodel Holdings, Inc. · US

Inventors

Diane Scott · Portland, US
Arthur Richard Baker, III · Wilmington, US
Tao Zhang · Beijing, CN

Key dates

Filing date	Jun 29, 2001
Grant date	Sep 23, 2003
Priority date	—
Expiry date	Jun 29, 2021

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB24D11/02
WIPO fieldMachine tools
WIPO sectorMechanical engineering

Abstract

The invention is directed to a base-pad for placement under a polishing pad for use with a polishing fluid during a polishing operation, the base-pad having a layer with vertical elongated pores that absorb polishing fluid and that confine absorbed polishing fluid from transport laterally in the base-pad. Micropores in the layer are impermeable to the polishing fluid and permeable to gasses.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.