Laser writer
US6624878B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 2, 2001 |
| Grant date | Sep 23, 2003 |
| Priority date | — |
| Expiry date | Nov 2, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70383
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A system and method are provided for microlithographic writing on photosensitive substrates, and especially high precision printing of patterns, such as photomasks, for semiconductor device patterns, display panels, integrated optical devices and electronic interconnect structures. The method includes the steps of detecting significant temporary writing error conditions and interrupting the writing process as a response to a detection of such an error condition. Thereafter a support table is reversed to the position it had when the writing was interrupted, and the writing process is restarted at the same position where the writing was interrupted when the error condition ceases to exist.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.