System and method for metrology of surface flatness and surface nanotopology of materials
US6624896B1 · kind B1 · utility
11Cited by
5References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 18, 2000 |
| Grant date | Sep 23, 2003 |
| Priority date | — |
| Expiry date | Mar 17, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B11/303
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A metrology system and method uses pulsed light to allow continuous movement of a target relative to the sensor. A metrology system and method uses dynamic adjustment of tilt in a system. A metrology system and method calibrates the system to remove inherent optical aberrations in the system. Filtering may also be used in the system to increase accuracy.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.